Vertical Furnace for Small Production and R&D

This small production type vertical furnace for experiments and research (R&D) achieves high-quality processing.
This furnace is compact and requires only a small installation area but is usable for a wide range of wafer diameters and exhibits the same temperature characteristics as those of mass-production furnaces.

Features

Mini batch, max 25 wafers batch processing
2- to 8-inch and 300-mm wafer size are available

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Overview

This vertical furnace for experiments, research (R&D) and small production can be used for a wide range of wafer sizes from 2- to 8-inch and up to 300-mm, and the size of mini batch can also be chosen from up to 25 wafers. Since the heater can be chosen from our proprietary Light Gauge Over-bend heater and various other heaters, process development is available with the same furnace opening structure and heater performance as those of mass-production furnaces. This furnace can be used for various silicon wafer treatments (LPCVD, oxidation and diffusion), silicon gate oxynitriding and activation annealing for power device (Si and SiC) development, and a wide range of other processes.

Specifications

Model	VF-1000
Outer dimension	W1500 × D1000 × H2130 mm (2 to 8 inch) W1800 × D1400 × H2300 mm (φ300 mm)
Flat zone length	Up to 250 mm
Wafer size	2 to 8 inch and 300 mm
Batch size	Up to 25 wafers
Options	Forced-cooling system N₂ load lock 300mm wafer processing