VF-3000 Low-Cost Mini Batch Vertical Furnace

This low-priced vertical furnace equipped with an auto conveyor can be used for a range of functions from R&D to mass production of 4- to 8-inch wafers.
We have achieved such a low price that back end users can introduce this furnace.
Ultra-high-temperature treatment is available and best suited for power device manufacturing.


  • Low-cost equipment for back end users
  • Mini batch, 50 to 75 wafers processing is available for R&D to mass-production line
  • 4- to 8-inch wafer size is available
  • Max 4 cassette stocks
  • Excellent temperature control from low to medium high temperature range using an LGO heater
  • High-speed wafer transfer using a single wafer handling robot
  • Equipped with limited-function simple control system


This furnace can be used for a wide range of wafer sizes from 4-inch to 8-inch, and processing in 50–75 wafers of mini batches can be chosen. With the hardware and control system content carefully selected to achieve a low price, this vertical furnace can be used for a wide range of functions from R&D to mass-production lines. Choose and use a suitable heater from an LGO heater, molybdenum disilicide (MoSi2) heater and carbon heater not only for low-temperature annealing, nitride (Si3N4), polysilicon (poly Si) and other material LPCVD, oxidation and diffusion but also for SiC power device gate silicon oxynitriding, activation annealing and other ultra-high-temperature treatment processes.


Outer dimension W1200×D1450×H2610 mm
Heater LGO heater
Flat zone length to 360 mm
Wafer size 4 to 8 inch
Batch size Max. 75 wafers(50 wafers at 8 inch)
I/O port 4
Number of cassette stock 4
Finger Single wafer
Options Forced-cooling system
N2 load lock
Convertible wafer size

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