VF-3000 Low-Cost Mini Batch Vertical Furnace

This low-priced vertical furnace equipped with an auto conveyor can be used for a range of functions from R&D to mass production of 4- to 8-inch wafers.
We have achieved such a low price that back end users can introduce this furnace.
Ultra-high-temperature treatment is available and best suited for power device manufacturing.

Features

Low-cost equipment for back end users
Mini batch, 50 to 75 wafers processing is available for R&D to mass-production line
4- to 8-inch wafer size is available
Max 4 cassette stocks
Excellent temperature control from low to medium high temperature range using an LGO heater
High-speed wafer transfer using a single wafer handling robot
Equipped with limited-function simple control system

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Overview
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Overview

This furnace can be used for a wide range of wafer sizes from 4-inch to 8-inch, and processing in 50–75 wafers of mini batches can be chosen. With the hardware and control system content carefully selected to achieve a low price, this vertical furnace can be used for a wide range of functions from R&D to mass-production lines. Choose and use a suitable heater from an LGO heater, molybdenum disilicide (MoSi2) heater and carbon heater not only for low-temperature annealing, nitride (Si3N4), polysilicon (poly Si) and other material LPCVD, oxidation and diffusion but also for SiC power device gate silicon oxynitriding, activation annealing and other ultra-high-temperature treatment processes.

Specifications

Outer dimension	W1200×D1450×H2610 mm
Heater	LGO heater
Flat zone length	to 360 mm
Wafer size	4 to 8 inch
Batch size	Max. 75 wafers（50 wafers at 8 inch）
I/O port	4
Number of cassette stock	4
Finger	Single wafer
Options	Forced-cooling system N₂ load lock Convertible wafer size