RLA-3100-V Lamp Annealing System for Contact Annealing
Overview
RLA-3100-V is a lamp annealing system that supports wafer sizes of up to 6 inches. A vacuum-resistant quartz tube enables processing in clean vacuum (LP) environments and N2 load-lock atmospheres. RLA-3100-V also enables GaN substrate processing.
Specifications
Operating temperature range | 600 to 1,200°C |
---|---|
Supported wafer sizes | Up to 6 inches |
Gases used | N2, Ar, O2, H2 |
Applications | Contact annealing, oxidation (enables depressurized processing and processing in N2 load-lock environments) |
Applications
Customize
Related Solution Cases
-
[case-004] Improving Productivity (fully automated transfer)
Improving productivity with fully automated transfer
- Contact annealing
- RLA-3000-V