Flat Panel and Film
We are dedicated to the pursuit of the clean performance and uniform heat treatment quality that are required in the manufacturing field for flat panel displays, film materials, and sheet materials.
JTEKT Thermo Systems is contributing to a wide range of heat treatments that are used in the manufacture of flat panel displays, film materials, and sheet materials. Examples include our clean heating systems for products such as liquid crystal displays (LCD) and organic EL (OLED), as well as our furnaces for sheet materials such as high-performance films and rechargeable battery electrode materials.
The workpieces treated with these types of equipment are evolving rapidly, in terms of both the materials and processes that affect the performance of the equipment, and their applications have expanded into new fields. As revolutionary performance is demanded of production equipment, JTEKT Thermo Systems proposes new solutions to meet customer needs based on the wealth of experience and technology which we have developed through our history.
Clean ovens for flat panel displays
Clean Oven, Single Substrate Transfer Type
High productivity, high clean factor, damage free. Supports operations in gaseous atmospheres
Applications : Post baking of color filter resist, annealing, seal main curing/pre-curing, baking polyimide coating
IR Furnace, Single Substrate Transfer Type
CCBS - IR series
High heating efficiency at high cleanliness
Supports operations in gaseous atmospheres
Applications: Baking polyimide coating, annealing, baking passivation film, seal main curing/pre-curing
Roller Hearth Continuous Furnace
Cleans and improves workplace environments.
Applications: High temperature baking of various kinds of paste and films of the FPD, solar panel
Resin Belt Type Drying Furnace
Causing no tension on the substrates due to adoption of the resin conveyor belt.
Achieving clean environment (Class 100) by reducing dust generation in the furnace.
Applications: Heat treatment of protection sheets and films
Clean Batch System CBS series
Our proprietary seal structure allows anti-oxidation treatment by charging inert gas.
An ultra high-temperature HEPA filter allows maximum operating temperature of 500°C.
The adoption of an oven forced cooling mechanism and faster substrate transfer enables high throughput.
Applications：Various annealing of LTPS (low temperature polysilicon) and TFT
Walking Beam Type Continuous Clean Oven WB series
A walking-beam system with superior clean performance is adopted for transport inside the oven.
High production efficiency is enabled by batch transport of glass substrate using heat-resistant cassettes.
Applications：Annealing of glass substrates