Vertical furnaces are used for processing wafers during semiconductor device manufacturing—including for film formation, annealing, and resin film hardening. These batch processing furnaces feature a vertically arranged quartz tube that heats objects placed around the tube for processing. Wafers are loaded onto quartz storage shelves called boats, which are loaded/unloaded from the bottom of the process tubes. With minimal particle generation, the furnaces provide excellent temperature distribution and atmosphere control. In addition, automatic wafer and boat transfer makes it possible to further improve productivity.
Conventional horizontal furnaces are prone to non-uniform film thicknesses within a batch and on wafer surfaces as well as particle and natural oxide film generation, and the equipment itself requires more area due to the increased wafer diameters. Vertical furnaces, however, are not limited by such problems, which factors into their mainstream popularity.

JTEKT Thermo Systems entered the semiconductor manufacturing equipment market in 1970 with the release of a horizontal heat treatment system manufactured under the Tempress Japan brand.
The Company has since provided a wide range of heat treatment technologies that have played a role in the growth and development of the semiconductor industry both in Japan and around the world.
Our focus on the niche markets we excel in and makes every effort to develop the new technologies and equipment those markets demand.
JTEKT Thermo Systems’ ability to propose various equipment—from small-volume production equipment for research and development and for state-of-the-art devices, to full-scale production equipment—can be utilized to provide satisfactory results that meet customer requirements.

Vertical Furnace LINEUP

Products	VF-5900300mmLarge Batch	VF-5700300mmMini Batch	VF-53008 inchLarge Batch	VF-51008 inchWide-Range Batch	VF-30008 inchLow-Cost Mini Batch	VF-1000Small Production and R&D	VFS-4000Large BoreVertical Furnace
Outer dimension	W1250 × D3200 × H3450 mm	W1250 × D2000 × H2850 mm	W900 × D2300 × H3300 mm	W1000 × D1950 × H3300 mm	W1200 × D1450 × H2610 mm	W1500 × D1000 × H2130 mm	Varies by specification
Flat zone length	1040 mm	500 mm	960 mm	360 to 960 mm	to 360 mm	to 250 mm	Varies by specification
Wafer size	300 mm	300 mm	6 to 8 inch	4 to 8 inch	4 to 8 inch	to 8 inch	Varies by specification
Batch size	100 wafers	50 wafers	150 wafers	Max. 150 wafers	Max. 75 wafers（50 wafers at 8 inch）	to 25 wafers	20 to 25 wafers
Number of Stock	16 FOUP	-	20 Casette	4 to 8 Casette	4 to 8 Casette	-	Varies by specification
Robot Finger	5 wafers + single wafer	5 wafers + single wafer	5 wafers + single wafer	5 wafers + single wafer	Single wafer	-	Single wafer
Apprications	Semiconductor, SiC Power Semiconductor, MEMS, VCSEL, PV (Photovoltaic)						FPD

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Related Solution Case

• 

  Establishment of the VCSEL Process

  Significant yield improvement was achieved with a special VCSEL-process dedicated furnace.

  See Solution Cases
  • Thermal oxideation
  • VF-3000(B)
• 

  Improving Yield for FPD Applications

  Achieving heat treatment at the cleanliness level of semiconductor fabrication equipment

  See Solution Cases
  • Metal contact annealing (for FPD)
  • Frit firing (for FPD)
  • Dehydrogenation (for FPD)
  • Activation (for FPD)
  • Curing (for FPD)
  • VFS-4000
• 

  Increasing Yield by Reducing Contaminants Within the Furnace

  Reducing sediment with an automatic cleaning mechanism inside the furnace

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  • Curing (for FPD)
  • VF-5300(B)
• 

  Improved Experimental and Development Accuracy

  Improving experimental and development accuracy with a high-performance small-scale vertical furnace for experiments

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  • Annealing
  • VF-1000(H)

Vertical Furnace Optimized Design

Flexible equipment layout

It is possible to move the gas box, etc. attached to the furnace to the rear side or under the floor and not just to the front or in the back. We can work around the restrictions of the equipment area and improve the maintainability of the equipment.

Vertical Furnace example

• Support for gas box layout changes
• Support for treatment using a liquid source at atmospheric pressure
• Support for selenization (Se) / sulfurization (S) treatment
• Vacuum support for large-bore furnaces (G4 size or larger)
• Carbon nanotube growth equipment
• Support for thin wafers (80μm or more)
• Fan-out wafer-enabled equipment
• Substrate support for large, FPD polyimide-cured panels
• Support for wet vacuum processing
• Support for dry vacuum (oxygen partial pressure control) processing
• Support for in-situ cleaning using ClF₃
• Support for processing bulk transports of quartz cassettes
  [Summary] The quartz cassette with wafers is transferred as it is, stacked, and subjected to heat treatment in that state.
• Support for flat poly-Si (with no temperature inclination)

* Support varies depending on the model.

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Demonstration and test areas

Comprehensive manufacturer of heat treatment equipment, which solves heat treatment problems from different fields beyond the boundaries of fields and areas

From equipment for research and development to production facilities, by assembling technicians in major business areas for vitalization of new products and technology development, and by installing our demonstration equipment for experiments and evaluations, JTEKT Thermo Systems is not only developing processes of its own but also providing the system that can be used for customers’ pre-tests and for performance evaluation.

Semiconductor manufacturing system area Inside the experimental laboratory, air cleanliness of Class 10 or higher must be ensured.

FAQ

• QWhere can I purchase the product?

  A

  After finalizing the specifications with the customer, we custom-build their order for them. We do not sell products wholesale or by mail order. For more information, please contact us.

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• QPlease tell me the product’s price.

  A

  Equipment specifications and price vary depending on the product. Please contact us.

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• QWhat kinds of heat treatment equipment do you handle?

  A

  We handle heat treatment equipment that can heat or add reactive gas to materials such as Si wafers, metal, rubber, glass, plastic, and fine ceramics during the film formation process to change the characteristics of those materials.

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• QCan you produce products not listed on the products page?

  A

  Please send us your request. We will propose optimal equipment specifications. For more information, please contact us.

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• QCan I verify the process in advance?

  A

  We do not lend out any products but we can perform a demonstration to verify a product’s performance. If you have any demonstration requests, please contact us.

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• QI am worried about whether I can operate and maintain the newly purchased equipment.

  A

  We provide training before delivery of purchased equipment so the customer and his/her staff members can use the equipment without worry. If you have any questions after delivery, we also provide support by telephone or email. Please contact our sales representative.

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About JTEKT Thermo Systems

The metallic components, ceramics, etc. of formed and fabricated materials that form the foundation of the industry; the semiconductors and electronic components that support the latest technologies; the displays that enrich people's lives and next-generation batteries that control global environment pollution; and experimental developments to create all of these industries—it is not an overstatement to say that the heat treatment equipment created by JTEKT Thermo Systems is involved in all of the industries in our lives. With the unique technology created by the "Technology Tree" that fused the five pieces of "Technology Leaves" that were cultivated with a history spanning half a century, we continue to contribute to every field in the world.

International Offices

HEAD OFFICE

1. JAPAN (Tenri)

JTEKT Thermo Systems Corporation

• 2. KOREA (Kyeonggi-do)

  KOYO THERMO SYSTEMS KOREA CO., LTD.

• 3. CHINA (Shanghai)

  KOYO THERMO SYSTEMS TRADING (SHANGHAI) CO.,LTD.

• 4. TAIWAN (Taipei)

  KOYO THERMO SYSTEMS ASIA CO., LTD.

• 5. TAIWAN (Taichung)

  KOYO THERMO SYSTEMS ASIA TECHNICAL SERVICE OFFICE IN TAICHUNG

• 6. THAILAND (Bangkok)

  JTEKT MACHINERY (THAILAND) CO., LTD.

• 7. U.S.A.

  SANDVIK THERMAL PROCESS, INC.

• 8. GERMANY

  CRYSTEC TECHNOLOGY TRADING GmbH

International Offices