These clean ovens for mass production can be used for various heat treatments in packaging processes, equipped with automatic substrate transfer mechanism supports various square substrates (up to 600x600mm) for advanced semiconductor packaging, in addition to Φ300mm wafers in which we have extensive experience in polyimide cure processing of FO-WLP and WL-CSP.
Low temperature processing such as polyimide curing is also available.

High-temperature baking in a clean environment is enabled by the heat-resistant high-performance filter and unique cooling unit. A hot-air circulation system is used to highly accurately carry out wafer and glass substrate baking/aging, polyimide curing and annealing.