This vertical furnace with a built-in stocker processes 8-inch wafers at ultra-high temperatures in large batches.
This furnace is a semiconductor heat treatment system that can perform oxidation, diffusion, LPCVD, activation annealing and various other heat treatments.
This large-batch, diffusion, LPCVD, vertical furnace performs 4- to 8-inch wafer ultra-high-temperature treatment.
The system can be flexibly configured to enable your production line to process a variety of products. This furnace excels at power device manufacturing.
This low-priced vertical furnace equipped with an auto conveyor can be used for a range of functions from R&D to mass production of 4- to 8-inch wafers.
We have achieved such a low price that back end users can introduce this furnace.
Ultra-high-temperature treatment is available and best suited for power device manufacturing.
This small production type vertical furnace for experiments and research (R&D) achieves high-quality processing.
This furnace is compact and requires only a small installation area but is usable for a wide range of wafer diameters and exhibits the same temperature characteristics as those of mass-production furnaces.
From small experiments and research (R&D) to mass production, these furnaces can be designed to meet users' needs.
These horizontal furnaces can be used for solar battery and photovoltaic power system (PV) production as well as silicon wafers.