This vertical furnace with a built-in stocker processes 8-inch wafers at ultra-high temperatures in large batches.
This furnace is a semiconductor heat treatment system that can perform oxidation, diffusion, LPCVD, activation annealing and various other heat treatments.
This large-batch, diffusion, LPCVD, vertical furnace performs 4- to 8-inch wafer ultra-high-temperature treatment.
The system can be flexibly configured to enable your production line to process a variety of products. This furnace excels at power device manufacturing.
This small production type vertical furnace for experiments and research (R&D) achieves high-quality processing.
This furnace is compact and requires only a small installation area but is usable for a wide range of wafer diameters and exhibits the same temperature characteristics as those of mass-production furnaces.
This low-priced vertical furnace equipped with an auto conveyor can be used for a range of functions from R&D to mass production of 4- to 8-inch wafers.
We have achieved such a low price that back end users can introduce this furnace.
Ultra-high-temperature treatment is available and best suited for power device manufacturing.
